Vacuum installation VTT-2000.
- Details
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It is intended for drawing of protective and protectively-decorative coverings by refractory electrospent materials: the titan, chrome, zirconium, molybdenum, the titan, aluminium, and also their connections with gases (TiN, TiC, ZrN, AlN-TiN-AlN etc.) vakuumno-plasma way on substrates from metal of ceramics, glass, plastic, etc.
Technical characteristics:
Internal diameter of the chamber 1100mm;
Chamber height 2000mm;
Limiting residual pressure in the chamber 2*10-3 Pases
Installation structure.
|
Name |
Quantity |
| Quantity of arc evaporators, -arches from 50 to 200 A. |
8 |
|
Quantity of ionic sources of clearing and sedimentation |
1 |
|
Power unit basic/high |
1 |
| Industrial equipment of planetary type (The industrial equipment variant directly under a product of the customer) is possible |
1 |
| Forvakuumnyj unit HBP 63/ND-500 (The complete set the pump of German firm PFEIFFER) is possible |
1 |
|
Highvacuum ehaust modules on base pump НВДН-400/7000 |
1 |
|
Heaters intrachamber with possibility of regulation of temperature of a substrate to 400ºС |
2 |
|
System pneumatic on the basis of SMC |
1 |
|
System hydraulic (ASCO) |
1 |
| Control system: 1 variant - on the basis of controller SIEMENS; 2 variant - on the basis of the personal computer |
1 |
|
The block напуска jet gases with possibility of maintenance of automatic maintenance of pressure |
1 |